Dielectric Breakdown in Gigascale Electronics

Dielectric Breakdown in Gigascale Electronics

Time Dependent Failure Mechanisms

Borja, Juan Pablo; Plawsky, Joel; Lu, Toh-Ming

Springer International Publishing AG

09/2016

105

Mole

Inglês

9783319432182

15 a 20 dias

1883

Descrição não disponível.
Introduction.- General Theories.- Measurement Tools and Test Structures.- Experimental Techniques.- Breakdown Experiments.- Kinetics of Charge Carrier Confinement in Thin Dielectrics.- Theory of Dielectric Breakdown in Nanoporous Thin Films.- Dielectric Breakdown in Copper Interconnects.- Reconsidering Conventional Models.
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Chip Interconnects;Dielectric Breakdown;Interconnect Reliability Science;Low-k Interconnect;Metal Catalyzed Dielectric Failure;Nanoporous Dielectrics;Reliability of Gigascale Electronics;Reliability of Modern Porous Low-k Films;TDDB for Gigascale Electronic Devices;TDDB in Modern Interconnects;Time-dependent-dielectric-breakdown (TDDB)