Dielectric Breakdown in Gigascale Electronics
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portes grátis
Dielectric Breakdown in Gigascale Electronics
Time Dependent Failure Mechanisms
Borja, Juan Pablo; Plawsky, Joel; Lu, Toh-Ming
Springer International Publishing AG
09/2016
105
Mole
Inglês
9783319432182
15 a 20 dias
1883
Descrição não disponível.
Introduction.- General Theories.- Measurement Tools and Test Structures.- Experimental Techniques.- Breakdown Experiments.- Kinetics of Charge Carrier Confinement in Thin Dielectrics.- Theory of Dielectric Breakdown in Nanoporous Thin Films.- Dielectric Breakdown in Copper Interconnects.- Reconsidering Conventional Models.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Chip Interconnects;Dielectric Breakdown;Interconnect Reliability Science;Low-k Interconnect;Metal Catalyzed Dielectric Failure;Nanoporous Dielectrics;Reliability of Gigascale Electronics;Reliability of Modern Porous Low-k Films;TDDB for Gigascale Electronic Devices;TDDB in Modern Interconnects;Time-dependent-dielectric-breakdown (TDDB)
Introduction.- General Theories.- Measurement Tools and Test Structures.- Experimental Techniques.- Breakdown Experiments.- Kinetics of Charge Carrier Confinement in Thin Dielectrics.- Theory of Dielectric Breakdown in Nanoporous Thin Films.- Dielectric Breakdown in Copper Interconnects.- Reconsidering Conventional Models.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Chip Interconnects;Dielectric Breakdown;Interconnect Reliability Science;Low-k Interconnect;Metal Catalyzed Dielectric Failure;Nanoporous Dielectrics;Reliability of Gigascale Electronics;Reliability of Modern Porous Low-k Films;TDDB for Gigascale Electronic Devices;TDDB in Modern Interconnects;Time-dependent-dielectric-breakdown (TDDB)